장비검색/예약
- 홈
- 장비활용
- 장비검색/예약
정보제공 : ZEUS 장비활용종합포털(www.zeus.go.kr)
임계치수 측정 주사현미경(SM01)
CD-SEM
| GBTP No. | - |
|---|---|
| NFEC등록번호 | NFEC-2010-12-120193 |
| I-tube등록번호 | 0802-C-0003 |
| 보유기관 | 포항공과대학교 |
| 연락처 | 054-279-0227 |
| 대표번호 | - |
장비정보
| 모델명 | S-9380-II | 제작사 | Hitachi |
|---|---|---|---|
| 취득일자 | 2008-02-08 | 취득금액 | 1,200,000,000원 |
| 표준분류 | 기계가공/시험장비 > > | 활용용도 | 시험 |
| 장비위치 |
경상북도 포항시 남구 청암로 77 (지곡동) 산27 포항공과대학교 나노기술집적센터 F2 photo
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| 장비설명 |
특징
(1) General Specifications Wafer size : 300 mm in diameter (Custom-tailored for 200 mm-dia. wafers) The orientation flat or V notch meeting the SEMI or JEIDA standards is applicable. Measuring method : Cursor and line profile measurement Measuring range : 0.05 to 2.0 m (For a measuring range of less than 0.05 ？m a separate consultation is available.) Measuring repeatability : 1% or 2 nm (3 ) whichever greater Throughput : 24 wafers/hour or more in continuous measurement mode (Measurement points: 1 point/chip 20 chips/wafer) (with Hitachi standard test wafer under Hitachi’s measurement conditions) Secondary electron image resolution : 2 nm (accelerating voltage 0.8 kV) Magnification : 1000 to 300000 (SEM image) Approx. 110 (optical microscope image) (220 selectable by option setting) (measurement accuracy guaranteed at 40000 to 300000) Measuring mode : Auto measurement or manual measurement |
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| 구성 및 기능 |
(1) General Specifications Wafer size : 300 mm in diameter (Custom-tailored for 200 mm-dia. wafers) The orientation flat or V notch meeting the SEMI or JEIDA standards is applicable.
Measuring method : Cursor and line profile measurement Measuring range : 0.05 to 2.0 m (For a measuring range of less than 0.05 ？m a separate consultation is available.) Measuring repeatability : 1% or 2 nm (3 ) whichever greater Throughput : 24 wafers/hour or more in continuous measurement mode (Measurement points: 1 point/chip 20 chips/wafer) (with Hitachi standard test wafer under Hitachi’s measurement conditions) Secondary electron image resolution : 2 nm (accelerating voltage 0.8 kV) Magnification : 1000 to 300000 (SEM image) Approx. 110 (optical microscope image) (220 selectable by option setting) (measurement accuracy guaranteed at 40000 to 300000) Measuring mode : Auto measurement or manual measurement |
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| 사용/활용예 |
Measuring repeatability : 1% or 2 nm (3 ) whichever greater
Throughput : 24 wafers/hour or more in continuous measurement mode (Measurement points: 1 point/chip 20 chips/wafer) (with Hitachi standard test wafer under Hitachi’s measurement conditions) |
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